首页> 外文OA文献 >The impact of repetitive unclamped inductive switching on the electrical parameters of low-voltage trench power nMOSFETs
【2h】

The impact of repetitive unclamped inductive switching on the electrical parameters of low-voltage trench power nMOSFETs

机译:重复的非钳位电感开关对低压沟槽功率nMOSFET的电学参数的影响

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

The impact of hot-carrier injection (HCI) due to repetitive unclamped inductive switching (UIS) on the electrical performance of low-voltage trench power n-type MOSFETs (nMOSFETs) is assessed. Trench power nMOSFETs with 20- and 30-V breakdown voltage ratings in TO-220 packages have been fabricated and subjected to over 100 million cycles of repetitive UIS with different avalanche currents IAV at a mounting base temperature TMB of 150°C. Impact ionization during avalanche conduction in the channel causes hot-hole injection into the gate dielectric, which results in a reduction of the threshold voltage VGSTX, as the number of avalanche cycles N increases. The experimental data reveal a power-law relationship between the change in the threshold voltage ΔVGSTX and N. The results show that the power-law prefactor is directly proportional to the avalanche current. After 100 million cycles, it was observed in the 20-V rated MOSFETs that the power-law prefactor increased by 30% when IAV was increased from 160 to 225 A, thereby approximating a linear relationship. A stable subthreshold slope with avalanche cycling indicates that interface trap generation may not be an active degradation mechanism. The impact of the cell pitch on avalanche ruggedness is also investigated by testing 2.5- and 4- m cell-pitch 30-V rated MOSFETs. Measurements showed that the power-law prefactor reduced by 40% when the cell pitch was reduced by 37.5%. The improved VGSTX stability with the smaller cell-pitch MOSFETs is attributed to a lower avalanche current per unit cell resulting in less hot-hole injection and, hence, smaller VGSTX shift. The 2.5-m cell-pitch MOSFETs also show 25% improved on -state resistance RDSON, better RDSON stability, and 20% less subthreshold slope compared with the 4-m cell-pitch MOSFETs, although with 100% higher initial IDSS and less IDSS stability with avalanche cycling. These results are important for manufacturers of automotive MOSFETs where multiple avalanche occurrences over the lifetime of the MOSFET are expected.
机译:评估了由于重复的未钳位电感开关(UIS)而引起的热载流子注入(HCI)对低压沟槽功率n型MOSFET(nMOSFET)的电气性能的影响。现已制造出TO-220封装中具有20V和30V击穿电压额定值的沟道功率nMOSFET,并在150°C的安装基准温度TMB下经受了超过1亿次循环的UIS重复,具有不同的雪崩电流IAV。在沟道中雪崩传导期间的碰撞电离导致热空穴注入到栅极电介质中,随着雪崩循环数N的增加,阈值电压VGSTX减小。实验数据揭示了阈值电压ΔVGSTX的变化和N之间的幂律关系。结果表明,幂律预因子与雪崩电流成正比。在经过一亿次循环之后,可以看到在额定20V的MOSFET中,当IAV从160A增加到225A时,功率定律预因子增加了30%,从而近似线性关系。具有雪崩循环的稳定的亚阈值斜率表明界面陷阱的产生可能不是主动的降解机制。单元间距对雪崩强度的影响也通过测试2.5至4 m单元间距30 V额定MOSFET进行了研究。测量表明,当单元间距减小37.5%时,幂律前因数减小40%。使用较小的单元间距MOSFET改善的VGSTX稳定性归因于每单位单元的雪崩电流较低,从而导致较少的热空穴注入,因此,VGSTX偏移较小。与4-m单元间距MOSFET相比,2.5 m单元间距MOSFET的导通态电阻RDSON改善了25%,RDSON稳定性更好,亚阈值斜率降低了20%,尽管初始IDSS高100%,IDSS更少雪崩循环的稳定性。这些结果对于汽车MOSFET的制造商而言非常重要,因为在汽车MOSFET的使用寿命中,预计会发生多次雪崩。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号